Intel release eco-friendly, high-performance 45nm processors

Processors using Intel 45nm Hafnium-based High-k Metal Gate transistor technology

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November 13, 2007 Intel has unveiled sixteen new chips incorporating 45nm Hafnium-based high-k metal gate transistors that are smaller, faster and more eco-friendly than previous generations. Gordon E. Moore, co-founder of Intel, has labeled the breakthrough as the biggest transistor advancement in 40 years with the improvement expected to further extend Moore’s Law, which he originally described in 1965.

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