Intel release eco-friendly, high-performance 45nm processors
Processors on an Intel 45nm Hafnium-based High-k Metal Gate ''Penryn'' Wafer photographed with a pin
Image 4 of 6
View Other Images From This Gallery
|
|
|
|
|
|
Article Summary
November 13, 2007 Intel has unveiled sixteen new chips incorporating 45nm Hafnium-based high-k metal gate transistors that are smaller, faster and more eco-friendly than previous generations. Gordon E. Moore, co-founder of Intel, has labeled the breakthrough as the biggest transistor advancement in 40 years with the improvement expected to further extend Moore’s Law, which he originally described in 1965.
« Back to Intel release eco-friendly, high-performance 45nm processors
