Fujitsu and Advantest JV to create 65nm process semiconductor prototypes using Electron Beam Direct Lithography as a new development environment
Images Gallery (return to article)
A-
A+
|
Share this article
Subscribe to gizmag
Related Articles
Layered fabrication now growing solid metal parts
Rapid prototyping to be used for human implant development
The ORION PLUS helium ion microscope
Wave powered machine produced drinkable water and electricity
Yet another flat panel display technology from Sony
Fujitsu Triples Charging Capacity of Fuel Cells for Mobile Phones
